WebCANON FPA 2000-i1 STEPPER Lithography The CANON FPA 2000-i1 is an advanced i-line wafer stepper that allows printing high-density VLSI devices and produces devices with the highest yields possible. Installation Ongoing Specifications Printing wavelength: i-line (365 nm) Wafer size: up to 4” Reticle size: 5” Numerical aperture: 0.52 WebCanon ES-3 4X Scanner Wafer Alignment System Description There are 5 bright field alignment illumination Modes on a Canon ES-3 UV Scanner: 1 [B-B/W] broadband 590+/- 60nm 2 HeNe/ Normal 632.8 nm 3 HeNe/ High 632.8 nm high coherence 4 [B-B/S] broadband narrow 560 +/- 35nm 5 [B-B/W] High broadband high coherence 590+/- 60nm …
Equipment Name: Canon 2500 i3 stepper - University of …
WebNikon continues to expand the MEMS Stepper product line to satisfy the unique photolithography requirements of Air Bearing Surface (ABS) fabrication for magnetic heads, Micro Electro Mechanical Systems (MEMS) and Light Emitting Diodes (LED). WebA reduction stepper is a stepper where the image on the reticle is larger than the desired image on the wafer, and the image is reduced by the projection optics before it reaches the wafer. The advantage of this system is that the resolution of the lithography step is not limited by the resolution of the reticle. oodles of o\u0027s cereal
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WebSr. Application & Equipment Engineer. Canon, Inc. 1997 - 19992 years. • Specialist in 248nm DUV-3000i4, 3000i5, 3000EX3, EX4, EX5 Steppers with process in Sub-quarter and beyond micron ... WebLITHOGRAPHY STEPPER OPTICS θo Source Aperture Condenser Lens Mask … WebNanolab runs a Canon FPA-3000EX4 DUV Stepper Lithography tool with critical dimension of 250nm on arbitrary shapes and down to 180nm lines and spaces with optimized illumination. The tool runs with 248nm light and has a maximum printing field size of 22 x 26, the original reticle (mask) feature size is reduced by a factor 5. ... iowa cashless wagering regulations